SEMICONDUCTOR PROMOTION DIVISION

W-357LS-80

Cleaning(High Frequencyj


semiconductorALCD cleaning
The ultrasonic cleaner high frequency inline type

W-357LS-80


œUsing higher-frequency magahertz energy with accelerrated water molecules,submicron level cleaning is possible,without damaging sensitive microelectronicdevice.
œThere is no worry of the re-adhesion of dirt in the liquid to always supply a clean cleaning solution.
œMinute dirt is instantaneously removed for the high frequency oscillation.
œIt is possible to wash it at ease by the output adjustment even by the one like the magnetic head that cracks easily.
¡Features
@ œProvides 80mm length of cleaning capabilityhoused . @ @ @
Model W-357LS-80
High Frequency Output 120‚vioutput adjustment)
Oscillation Frequency 1MHzinominalj
Power Supply AC 100V/3A,AC 200V/1.5A
Range of Liquid temperature 20`50Ž
Effetive cleaning dimensions W~Dimmj 80(W)~2(D) mm
Water Supply 8 L/min@
Outside Dimension(mm) Generator 232iWj~340iDj~137iHj
Nozzle 210iWj~85iDj~102iHj
Weight Generator 7kg
Nozzle 2kg
Water Intake R(PT)1/2inch socket
Output Cable 5m
Power Supply Cable 2m
Protection Circuit Dry operation prevention flowrate sensor (alarm circuit actirates below 7liter/min.)
Material SUS304/Silicon rubber/Tantalum


Semiconductor Promotion Division TEL:81-532-41-2774 MAIL:semi@honda-el.co.jp