SEMICONDUCTOR PROMOTION DIVISION

W-357-3MP

Cleaning(High Frequency）

semiconductor、LCD cleaning
The ultrasonic spray nozzle cleaners for 3MP type

W-357-3MP

●Using higher-frequency magahertz energy with accelerrated water molecules,submicron level cleaning is possible,without damaging sensitive microelectronicdevice.
●Applications include: cleaning of liquid crystal displays(LCDs),flat panel displays(FPDs), sillicon(or GaAs,sapphire,etc.)wafers (post-CMP,pre-diffusion,etc.), photomasks, reticules and numerous other applications where submicron particle removal is required.
●There is no worry of the re-adhesion of dirt in the liquid to always supply a clean cleaning solution.
●There is no worry of the re-adhesion of dirt in the liquid to always supply a clean.
●Minute dirt is instantaneously removed for the high frequency oscillation.
●It is possible to wash it at ease by the output adjustment even by the one like the magnetic head that cracks easily.
■Features
　 Higher Frequency megasonic output of 3MHz offers smaller
submicron particle removal capability.
　 In the horn, the metal ion is hardly generated.
Model W-357-3MP
High Frequency Output 60Ｗ（output adjustment)
Oscillation Frequency 3MHz
Power Supply AC100V/2A
Range of Liquid temperature 20～40℃
Transducer nozzle（mm） Φ4.0
Water Supply 0.9 L/min(Straight　type conector)　
Outside Dimension(mm) Generator 232（W）×342（D）×138（H）
Nozzle 29×35×92
Weight Generator 8kg
Nozzle 100g
Water Intake R(PT)1/2inch socket (Applicable tube size:outer dia. 6mm,inner dia. 4mm)
Output Cable 5m
Power Supply Cable 2m
Protection Circuit Dry operation prevention cable ,
alarm output cable ５m
Material PCTFE/Silicon rubber/Tantalum/PTFE

Semiconductor Promotion Division TEL:81-532-41-2774 MAIL:semi@honda-el.co.jp