SEMICONDUCTOR PROMOTION DIVISION

W-357LS-580

Cleaning(High Frequency）

semiconductor、LCD cleaning
The ultrasonic cleaner high frequency inline type

W-357L580

●Using higher-frequency magahertz energy with accelerrated water molecules,submicron level cleaning is possible,without damaging sensitive microelectronicdevice.
●Applications include: cleaning of liquid crystal displays(LCDs),flat panel displays(FPDs), sillicon(or GaAs,sapphire,etc.)wafers (post-CMP,pre-diffusion,etc.), photomasks, reticules and numerous other applications where submicron particle removal is required.
●There is no worry of the re-adhesion of dirt in the liquid to always supply a clean cleaning solution.
●There is no worry of the re-adhesion of dirt in the liquid to always supply a clean.
●Minute dirt is instantaneously removed for the high frequency oscillation.
●It is possible to wash it at ease by the output adjustment even by the one like the magnetic head that cracks easily.
■Features
　 Provides 580mm length of cleaning capabilityhoused inpolypropylene to prevent metalic contamination.
　 Provides cleaning capabilityhoused inpolypropylene to prevent metallic contamination.
Model W-357LS-580
High Frequency Output 720W（output adjustment)
Oscillation Frequency 1MHz
Power Supply AC200V/3A×3
Range of Liquid temperature 20～40℃
Effective cleaning dimensions W×D（mm） 580（W）×2（D）
Water Supply 45 L/min　
Outside Dimension(mm) Generator 358（W）×475（D）×137（H）×3
Nozzle 682（W）×182（D）×105（H）
Weight Generator 15kg×3
Nozzle 6kg
Water Intake R(PT)1/2inch elbow
(Applicable tube size:outer dia. 13mm,inner dia. 11mm) 　
Output Cable 5m
Power Supply Cable 5m（Conecter Type）
Protection Circuit Dry operation prevention signal terminal/Dry operation prevention cable length 5m
Material Polypropylene/Silicon rubber/Tantalum


Semiconductor Promotion Division TEL:81-532-41-2774 MAIL:semi@honda-el.co.jp