SEMICONDUCTOR PROMOTION DIVISION

W-357P-25

Cleaning(High Frequencyj

semiconductorALCD cleaning
The ultrasonic spray nozzle cleaners

W-357P25


œUsing higher-frequency magahertz energy with accelerrated water molecules,submicron level cleaning is possible,without damaging sensitive microelectronicdevice.
œApplications include: cleaning of liquid crystal displays(LCDs),flat panel displays(FPDs), sillicon(or GaAs,sapphire,etc.)wafers (post-CMP,pre-diffusion,etc.), photomasks, reticules and numerous other applications where submicron particle removal is required.
œThere is no worry of the re-adhesion of dirt in the liquid to always supply a clean cleaning solution.
œThere is no worry of the re-adhesion of dirt in the liquid to always supply a clean.
œMinute dirt is instantaneously removed for the high frequency oscillation.
œIt is possible to wash it at ease by the output adjustment even by the one like the magnetic head that cracks easily.
¡Features
@ œSmall housing (25mm dia.) is another compact,space-saving unit suitable for cleaning smaii areas.
@ œIn the horn, the metal ion is hardly generated.
@ @ œThere is a machine for CE, too.
Model W-357P-25
High Frequency Output 60‚vioutput adjustment)
Oscillation Frequency 1MHzinominalj
Power Supply AC 100V/3A,AC 200V/1.5A
Range of Liquid temperature 20`50Ž
Transducer nozzleimmj ƒ³4.2
Water Supply 1.5 L/min(L@type conector)@
Outside Dimension(mm) Generator 232iWj~342iDj~137iHj
Nozzle ƒ³25~80
Weight Generator 8kg
Nozzle 0.11kg
Water Intake R(PT)1/2inch socketG (Applicable tube size:outer dia. 6mm,inner dia. 4mm)
Output Cable 5m
Power Supply Cable 2m
Protection Circuit Dry operation prevention cable ,alarm output cable ‚Tm
Material PCTFE/Silicon rubber/Tantalum/PTFE

Semiconductor Promotion Division TEL:81-532-41-2774 MAIL:semi@honda-el.co.jp